Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti-Zr-N and Ti-Ta-N

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 541-551

  Abadias, G ^a   Koutsokeras, L E ^a,b   Dub, S N ^c   Tolmachova, G N ^d   Debelle, A ^e   Sauvage, T ^f   Villechaise, P ^a  

^a Institut Pprime   (France)

^b UNIVERSITY OF IOANNINA   (Greece)

^c BAKUL INSTITUTE FOR SUPERHARD MATERIALS   (Ukraine)

^d KHARKOV INSTITUTE OF PHYSICS AND TECHNOLOGY   (Ukraine)

^e UNIVERSITÉ PARIS SACLAY   (France)

^f CNRS CEMHTI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHLORINE COMPOUNDS; CONDUCTIVE FILMS; ELECTRIC DISCHARGES; MAGNETRONS; METALLIC FILMS; SODIUM COMPOUNDS; TANTALUM COMPOUNDS; THIN FILMS; TIN; TITANIUM NITRIDE; TRANSITION METALS; X RAY DIFFRACTION; ZIRCONIUM COMPOUNDS;

BINARY COMPOUNDS; COMPOSITIONAL RANGE; EQUILIBRIUM STATE; PLASMA DISCHARGE; REACTIVE MAGNETRON CO-SPUTTERING; SCANNING ELECTRONS; TRANSITION METAL NITRIDES; X RAY REFLECTIVITY;

BORON COMPOUNDS;

EID: 77954196319     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3426296     Document Type: Conference Paper

References (66)

1. H. Holleck, J. Vac. Sci. Technol. A JVTAD6 0734-2101 4, 2661 (1986). 10.1116/1.573700
2. R. A. Andrievski, J. Mater. Sci. JMTSAS 0022-2461 32, 4463 (1997). 10.1023/A:1018604830327
3. L. Hultman, Vacuum VACUAV 0042-207X 57, 1 (2000). 10.1016/S0042-207X(00) 00143-3
4. F. Ĺvy, P. Hones, P. E. Schmid, R. Sanjińs, M. Diserens, and C. Wiemer, Surf. Coat. Technol. SCTEEJ 0257-8972 120-121, 284 (1999). 10.1016/S0257-8972(99)00498-3
5. P. H. Mayrhofer, C. Mitterer, L. Hultman, and H. Clemens, Prog. Mater. Sci. PRMSAQ 0079-6425 51, 1032 (2006). 10.1016/j.pmatsci.2006.02.002 (Pubitemid 44540313)
6. J. -S. Chun, I. Petrov, and J. E. Greene, J. Appl. Phys. JAPIAU 0021-8979 86, 3633 (1999). 10.1063/1.371271
7. A. E. Kaloyeros and E. Eisenbraun, Annu. Rev. Mater. Sci. ARMSCX 0084-6600 30, 363 (2000). 10.1146/annurev.matsci.30.1.363
8. I. Grimberg, V. N. Zhitomirsky, R. L. Boxman, S. Goldsmith, and B. Z. Weiss, Surf. Coat. Technol. SCTEEJ 0257-8972 108-109, 154 (1998). 10.1016/S0257-8972(98)00658-6
9. H. Hasegawa, A. Kimura, and T. Suzuki, J. Vac. Sci. Technol. A JVTAD6 0734-2101 18, 1038 (2000). 10.1116/1.582296
10. J. Probst, U. Gbureck, and R. Thull, Surf. Coat. Technol. SCTEEJ 0257-8972 148, 226 (2001). 10.1016/S0257-8972(01)01357-3 (Pubitemid 34034417)
11. V. V. Uglov, V. M. Anishchik, V. V. Khodasevich, Zh. L. Prikhodko, S. V. Zlotski, G. Abadias, and S. N. Dub, Surf. Coat. Technol. SCTEEJ 0257-8972 180-181, 519 (2004). 10.1016/j.surfcoat.2003.10.095 (Pubitemid 38464097)
12. T. Seppänen, L. Hultman, and J. Birch, Appl. Phys. Lett. APPLAB 0003-6951 89, 181928 (2006). 10.1063/1.2382746 (Pubitemid 44711501)
13. A. Hoerling, J. Sjölen, H. Willmann, T. Larsson, M. Od́n, and L. Hultman, Thin Solid Films THSFAP 0040-6090 516, 6421 (2008). 10.1016/j.tsf.2007.12.133
14. V. V. Uglov, Surf. Coat. Technol. SCTEEJ 0257-8972 204, 2095 (2010). 10.1016/j.surfcoat.2009.11.023
15. N. N. Iosad, N. M. van der Pers, S. Grachev, V. V. Roddatis, B. D. Jackson, S. N. Polyakov, P. N. Dmitriev, and T. M. Klapwijk, J. Appl. Phys. JAPIAU 0021-8979 92, 4999 (2002). 10.1063/1.1510589 (Pubitemid 35360681)
16. T. Joelsson, L. Hultman, H. W. Hugosson, and J. M. Molina-Aldareguia, Appl. Phys. Lett. APPLAB 0003-6951 86, 131922 (2005). 10.1063/1.1884743 (Pubitemid 40564895)
17. M. Debessai, P. Fillip, and S. M. Aouadi, Appl. Surf. Sci. ASUSEE 0169-4332 236, 63 (2004). 10.1016/j.apsusc.2004.03.239
18. H. A. Jehn, F. Thiergarten, E. Ebersbach, and D. Fabian, Surf. Coat. Technol. SCTEEJ 0257-8972 50, 45 (1991). 10.1016/0257-8972(91)90191-X
19. S. M. Aouadi, T. Maeruf, R. D. Twesten, D. M. Mihut, and S. L. Rhode, Surf. Coat. Technol. SCTEEJ 0257-8972 200, 3411 (2006). 10.1016/j.surfcoat.2005. 02.169 (Pubitemid 43231181)
20. L. E. Toth, Transition Metal Carbides and Nitrides (Academic, New York, 1971), p. 97.
21. M. B. Kanoun, S. Goumri-Said, and M. Jaouen, Phys. Rev. B PRBMDO 0163-1829 76, 134109 (2007). 10.1103/PhysRevB.76.134109
22. F. Tian, J. D'Arcy-Gall, T. -Y. Lee, M. Sardela, D. Gall, I. Petrov, and J. E. Greene, J. Vac. Sci. Technol. A JVTAD6 0734-2101 21, 140 (2003). 10.1116/1.1525818
23. S. M. Aouadi, J. Appl. Phys. JAPIAU 0021-8979 99, 053507 (2006). 10.1063/1.2178394
24. C. Wiemer, R. Sanjińs, and F. Ĺvy, Surf. Coat. Technol. SCTEEJ 0257-8972 86-87, 372 (1996). 10.1016/S0257-8972(96)02953-2 (Pubitemid 126405959)
25. P. Hones, R. Sanjińs, and F. Ĺvy, Thin Solid Films THSFAP 0040-6090 332, 240 (1998). 10.1016/S0040-6090(98)00992-4
26. O. Bourbia, S. Achour, N. Tabet, M. Parlinska, and A. Harabi, Thin Solid Films THSFAP 0040-6090 515, 6758 (2007). 10.1016/j.tsf.2007.02.055 (Pubitemid 46670176)
27. L. E. Koutsokeras, G. Abadias, Ch. E. Lekka, G. M. Matenoglou, D. F. Anagnostopoulos, G. A. Evangelakis, and P. Patsalas, Appl. Phys. Lett. APPLAB 0003-6951 93, 011904 (2008). 10.1063/1.2955838
28. J. F. Yang, Z. G. Yuan, G. G. Zhang, X. P. Wanga, and Q. F. Fang, Mater. Res. Bull. MRBUAC 0025-5408 44, 1948 (2009). 10.1016/j.materresbull.2009.06.013
29. G. M. Matenoglou, L. E. Koutsokeras, Ch. E. Lekka, G. Abadias, C. Kosmidis, G. A. Evangelakis, and P. Patsalas, Surf. Coat. Technol. SCTEEJ 0257-8972 204, 911 (2009). 10.1016/j.surfcoat.2009.06.032
30. C. Stampfl, W. Mannstadt, R. Asahi, and A. J. Freeman, Phys. Rev. B PRBMDO 0163-1829 63, 155106 (2001). 10.1103/PhysRevB.63.155106
31. G. M. Matenoglou, L. E. Koutsokeras, and P. Patsalas, Appl. Phys. Lett. APPLAB 0003-6951 94, 152108 (2009). 10.1063/1.3119694
32. M. H. Oliver, Appl. Phys. Lett. APPLAB 0003-6951 93, 023109 (2008). 10.1063/1.2953541
33. W. Feng, G. Chen, L. Li, G. Lv, X. Zhang, E. Niu, C. Liu, and S. -Z. Yang, J. Phys. D: Appl. Phys. JPAPBE 0022-3727 40, 4228 (2007). 10.1088/0022-3727/40/14/018 (Pubitemid 47134560)
34. G. Abadias, L. E. Koutsokeras, Ph. Guerin, and P. Patsalas, Thin Solid Films THSFAP 0040-6090 518, 1532 (2009). 10.1016/j.tsf.2009.07.183
35. M. Mayer, Max-Planck-Institut für Plasmaphysik Report No. IPP 9/113, 1997.
36. G. Abadias, Y. Y. Tse, Ph. Gúrin, and V. Pelosin, J. Appl. Phys. JAPIAU 0021-8979 99, 113519 (2006). 10.1063/1.2197287 (Pubitemid 43932602)
37. B. N. Lucas, W. C. Oliver, and J. E. Swindeman, Mater. Res. Soc. Symp. Proc. MRSPDH 0272-9172 522, 3 (1998).
38. W. C. Oliver and G. M. Pharr, J. Mater. Res. JMREEE 0884-2914 7, 1564 (1992). 10.1557/JMR.1992.1564
39. C. -S. Shin, Y. -W. Kim, D. Gall, J. E. Greene, and I. Petrov, Thin Solid Films THSFAP 0040-6090 402, 172 (2002). 10.1016/S0040-6090(01)01618-2 (Pubitemid 34086488)
40. S. Berg and T. Nyberg, Thin Solid Films THSFAP 0040-6090 476, 215 (2005). 10.1016/j.tsf.2004.10.051 (Pubitemid 40259151)
41. T. Kubart, D. H. Trinh, L. Liljeholm, L. Hultman, H. Högberg, T. Nyberg, and S. Berg, J. Vac. Sci. Technol. A JVTAD6 0734-2101 26, 565 (2008). 10.1116/1.2913582
42. T. Nyberg, S. Berg, U. Helmersson, and K. Hartig, Appl. Phys. Lett. APPLAB 0003-6951 86, 164106 (2005). 10.1063/1.1906333 (Pubitemid 41077917)
43. D. Depla, S. Mahieu, and R. De Gryse, Thin Solid Films THSFAP 0040-6090 517, 2825 (2009). 10.1016/j.tsf.2008.11.108
44. G. M. Matenoglou, Ch. E. Lekka, L. E. Koutsokeras, G. Karras, C. Kosmidis, G. A. Evangelakis, and P. Patsalas, J. Appl. Phys. JAPIAU 0021-8979 105, 103714 (2009). 10.1063/1.3131824
45. I. Petrov, P. B. Barna, L. Hultman, and J. E. Greene, J. Vac. Sci. Technol. A JVTAD6 0734-2101 21, S117 (2003). 10.1116/1.1601610
46. S. Mahieu, P. Ghekiere, D. Depla, and R. De Gryse, Thin Solid Films THSFAP 0040-6090 515, 1229 (2006). 10.1016/j.tsf.2006.06.027 (Pubitemid 44724910)
47. J. A. Thornton, J. Vac. Sci. Technol. A JVTAD6 0734-2101 4, 3059 (1986). 10.1116/1.573628
48. G. Abadias and Ph. Guerin, Appl. Phys. Lett. APPLAB 0003-6951 93, 111908 (2008). 10.1063/1.2985814
49. F. M. d'Heurle, Metall. Trans. MTGTBF 0026-086X 1, 725 (1970).
50. R. W. Hoffman, in Physics of Thin Films, edited by, G. Haas, and, R. E. Thun, (Academic, New York, 1966), Vol. 3, p. 211.
51. A. J. Perry, J. Vac. Sci. Technol. A JVTAD6 0734-2101 8, 1351 (1990). 10.1116/1.576881
52. J. D. Kamminga, Th. H. de Keijser, R. Delhez, and E. J. Mittemeijer, J. Appl. Phys. JAPIAU 0021-8979 88, 6332 (2000). 10.1063/1.1319973
53. P. Patsalas, C. Gravalidis, and S. Logothetidis, J. Appl. Phys. JAPIAU 0021-8979 96, 6234 (2004). 10.1063/1.1811389 (Pubitemid 44938191)
54. G. K. Williamson and W. H. Hall, Acta Metall. AMETAR 0001-6160 1, 22 (1953). 10.1016/0001-6160(53)90006-6
55. Th. H. de Keijser, J. I. Langford, E. J. Mittemeijer, and A. B. P. Vogels, J. Appl. Crystallogr. JACGAR 0021-8898 15, 308 (1982). 10.1107/S0021889882012035
56. G. Abadias and Y. Y. Tse, J. Appl. Phys. JAPIAU 0021-8979 95, 2414 (2004). 10.1063/1.1646444
57. S. Mahieu and D. Depla, J. Phys. D: Appl. Phys. JPAPBE 0022-3727 42, 053002 (2009). 10.1088/0022-3727/42/5/053002
58. J. E. Greene, J. E. Sundgren, L. Hultman, I. Petrov, and D. B. Bergstrom, Appl. Phys. Lett. APPLAB 0003-6951 67, 2928 (1995). 10.1063/1.114845
59. L. G. Parratt, Phys. Rev. PRVAAH 0096-8250 95, 359 (1954). 10.1103/PhysRev.95.359
60. L. Ńvot and P. Croce, Rev. Phys. Appl. RPHAAN 0035-1687 15, 761 (1980). 10.1051/rphysap:01980001503076100
61. L. E. Toth, Transition Metal Carbides and Nitrides (Academic, New York, 1971), p. 188.
62. S. Nagao, K. Nordlund, and R. Nowak, Phys. Rev. B PRBMDO 0163-1829 73, 144113 (2006). 10.1103/PhysRevB.73.144113 (Pubitemid 43663812)
63. H. Ljungcrantz, M. Od́n, L. Hultman, J. E. Greene, and J. -E. Sundgren, J. Appl. Phys. JAPIAU 0021-8979 80, 6725 (1996). 10.1063/1.363799
64. W. -J. Chou, G. -P. Yu, and J. -H. Huang, Thin Solid Films THSFAP 0040-6090 405, 162 (2002). 10.1016/S0040-6090(01)01762-X (Pubitemid 34187561)
65. S. Veprek, M. G. J. Veprek-Heijman, P. Karvankova, and J. Prochazka, Thin Solid Films THSFAP 0040-6090 476, 1 (2005). 10.1016/j.tsf.2004.10.053 (Pubitemid 40245039)
66. J. Musil, P. Karvankova, and J. Kasl, Surf. Coat. Technol. SCTEEJ 0257-8972 139, 101 (2001). 10.1016/S0257-8972(01)00989-6 (Pubitemid 32277240)