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Volumn 44, Issue 10, 2009, Pages 1948-1953
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Manufacture, microstructure and mechanical properties of Mo-W-N nanostructured hard films
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Author keywords
A. Nitrides; A. Thin films; B. Sputtering; C. X ray diffraction; D. Mechanical properties
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Indexed keywords
A. NITRIDES;
A. THIN FILMS;
B. SPUTTERING;
C. X-RAY DIFFRACTION;
D. MECHANICAL PROPERTIES;
ADHESION;
ATOMS;
CORROSION RESISTANCE;
DIFFRACTION;
HARDNESS;
INDENTATION;
MICROSTRUCTURE;
MOLYBDENUM;
NITRIDES;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
STEEL;
THIN FILMS;
TUNGSTEN;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
MECHANICAL PROPERTIES;
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EID: 68749119338
PISSN: 00255408
EISSN: None
Source Type: Journal
DOI: 10.1016/j.materresbull.2009.06.013 Document Type: Article |
Times cited : (32)
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References (29)
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