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Volumn 515, Issue 17, 2007, Pages 6758-6764
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Effect of tantalum addition on microstructure and optical properties of TiN thin films
c
EPFL
(Switzerland)
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Author keywords
Reflectance; Sputtering; Ta; TiN; Valence band
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
MAGNETRON SPUTTERING;
MICROSTRUCTURE;
OPTICAL PROPERTIES;
REFLECTION;
SURFACE ROUGHNESS;
TANTALUM;
TITANIUM NITRIDE;
VALENCE BANDS;
X RAY PHOTOELECTRON SPECTROSCOPY;
CRYSTALLIZED FILMS;
DIRECT CURRENT MAGNETRON SPUTTERING;
ELONGATED NANOCRYSTALLITES;
NANOSTRUCTURED SURFACES;
THIN FILMS;
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EID: 34247573422
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2007.02.055 Document Type: Article |
Times cited : (29)
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References (18)
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