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Volumn 332, Issue 1-2, 1998, Pages 240-246
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Sputter deposited chromium nitride based ternary compounds for hard coatings
a
EPFL
(Switzerland)
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Author keywords
CrN; Magnetron sputtering; Ternary compounds; Transition metal nitrides
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Indexed keywords
BAND STRUCTURE;
CHROMIUM ALLOYS;
GRAIN SIZE AND SHAPE;
HARDNESS;
LATTICE CONSTANTS;
MAGNETRON SPUTTERING;
MORPHOLOGY;
NITRIDES;
SPUTTER DEPOSITION;
TERNARY SYSTEMS;
TEXTURES;
THIN FILMS;
ELECTRON PROBE MICROANALYSIS;
METALLIC FILMS;
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EID: 0032476281
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(98)00992-4 Document Type: Article |
Times cited : (158)
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References (21)
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