Recent applications of plasma-based ion implantation and deposition to microelectronic, nano-structured, and biomedical materials

Surface and Coatings Technology

Volumn 204, Issue 18-19, 2010, Pages 2853-2863

  Chu, Paul K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Biomaterials; High k dielectrics; Microelectronics; Nanotechnology; Plasma immersion ion implantation and deposition

Indexed keywords

ALUMINUM NITRIDE; BIOCOMPATIBILITY; BIOMATERIALS; BIOMEDICAL ENGINEERING; DEPOSITION; DIELECTRIC MATERIALS; HIGH-K DIELECTRIC; ION IMPLANTATION; IONS; MEMS; MICROELECTRONICS; NANODIAMONDS; NANOTECHNOLOGY; OPTICAL PROPERTIES; PLASMA STABILITY; SEMICONDUCTOR DOPING; SILICON WAFERS; SINGLE CRYSTALS; SURFACE TREATMENT;

ANTIBACTERIAL PROPERTIES; HIGH DIELECTRIC CONSTANT (HIGH-K); MICRO ELECTRO MECHANICAL SYSTEM; PLASMA BASED ION IMPLANTATION AND DEPOSITION; PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION; PLASMA-BASED TECHNOLOGY; SINGLE CRYSTAL SILICON; SURFACE MODIFICATION TECHNIQUES;

PLASMA APPLICATIONS;

EID: 77953355975     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.01.045     Document Type: Article

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