Third-generation plasma immersion ion implanter for biomedical materials and research

Review of Scientific Instruments

Volumn 72, Issue 3, 2001, Pages 1660-1665

  Chu, P K ^a   Tang, B Y ^a,b   Wang, L P ^a   Wang, X F ^b   Wang, S Y ^b   Huang, N ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035274631     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1340029     Document Type: Article

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