Measurement and analysis of deposition-etch characteristics of BF3 plasma immersion ion implantation

Review of Scientific Instruments

Volumn 73, Issue 2, 2002, Pages 840-

  Qin, Shu ^a   Bradley, Michael P ^a   Kellerman, Peter L ^a   Saadatmand, Kourosh ^a  

^a AXCELIS TECHNOLOGIES   (United States)

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EID: 0036473203     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1427353     Document Type: Article

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