Mechanism of apatite formation on hydrogen plasma-implanted single-crystal silicon

Applied Physics Letters

Volumn 85, Issue 16, 2004, Pages 3623-3625

  Liu, Xuanyong ^a,b   Fu, Ricky K Y ^a   Chu, Paul K ^a   Ding, Chuanxian ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; HYDROGEN; ION IMPLANTATION; MICROELECTROMECHANICAL DEVICES; MICROPROCESSOR CHIPS; PLASMAS; SINGLE CRYSTALS; SURFACE PROPERTIES; TRANSMISSION ELECTRON MICROSCOPY;

APATITE; FUNCTIONAL GROUPS; HYDROGEN IMPLANTATION; SINGLE-CRYSTAL SILICON WAFERS;

SILICON WAFERS;

EID: 9744284971     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1807009     Document Type: Article

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