Molybdenum-carbon film fabricated using metal cathodic arc and acetylene dual plasma deposition

Surface and Coatings Technology

Volumn 186, Issue 1-2 SPEC. ISS., 2004, Pages 112-117

  Fu, Ricky K Y ^a   Mei, Y F ^a   Shen, L R ^a,b   Siu, G G ^a   Chu, Paul K ^a   Cheung, W Y ^c   Wong, S P ^c  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b SOUTHWESTERN INSTITUTE OF PHYSICS   (China)

^c CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Diamond like carbon films (DLC); Dual plasma deposition; Metal doped DLC; Nanocrystalline carbides; Thermal stability

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CARBON; CROSSLINKING; ELECTRIC ARCS; ELECTRIC POTENTIAL; MOLYBDENUM; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL);

CROSS-LINKED STRUCTURES; METAL CATHODIC ARCS; PLASMA DEPOSITION; SUBSTRATE BIAS VOLTAGES;

DIAMOND LIKE CARBON FILMS;

FILM;

EID: 17644382976     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.024     Document Type: Article

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