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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 1, 2002, Pages 160-164

Effects of bias voltage on the corrosion resistance of titanium nitride thin films fabricated by dynamic plasma immersion ion implantation-deposition

(3) Tian, Xiubo a Fu, Ricky K Y a Chu, Paul K a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CORROSION RESISTANCE; HIGH ENERGY PHYSICS; INTERFACES (MATERIALS); ION BOMBARDMENT; ION IMPLANTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; THIN FILMS;

CORROSION CURRENT; ION MIXING; PLASMA IMMERSION;

TITANIUM NITRIDE;

EID: 0036162801 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1427892 Document Type: Article

Times cited : (14)

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