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Thin Solid Films

Volumn 390, Issue 1-2, 2001, Pages 139-144

Dynamic nitrogen and titanium plasma ion implantation/deposition at different bias voltages

(4) Tian, Xiubo a Wang, Langping a Zhang, Qingyu a Chu, Paul K a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

Interfacial ion mixing; Plasma deposition; Plasma implantation; Titanium nitride

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; FILM PREPARATION; GLOW DISCHARGES; ION IMPLANTATION; MORPHOLOGY; NITROGEN; PLASMA APPLICATIONS; STAINLESS STEEL; SUBSTRATES; TITANIUM;

PLASMA IMPLANTATION;

METALLIC FILMS;

EID: 0035973346 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)00949-X Document Type: Article

Times cited : (11)

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