Plasma-nitrided high-k polycrystalline nano-array induced by electron irradiation

Nanotechnology

Volumn 17, Issue 17, 2006, Pages 4379-4383

  Huang, A P ^a   Wang, L ^b   Xu, J B ^b   Chu, Paul K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTALLOGRAPHY; ELECTRONS; HAFNIUM COMPOUNDS; HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IRRADIATION; MICROSCOPIC EXAMINATION; PLASMA APPLICATIONS; PLASMAS; THICK FILMS; ZIRCONIUM ALLOYS;

ARRAY FORMATIONS; ELECTRON BOMBARDMENTS; HIGH RESOLUTIONS; POLYCRYSTAL LINES;

ELECTRON IRRADIATION;

NANOCRYSTAL; NANOPARTICLE; NITRIC ACID; ZIRCONIUM OXIDE;

ARTICLE; CRYSTAL STRUCTURE; ELECTRON TRANSPORT; FILM; NANOARRAY; NONHUMAN; PARTICLE SIZE; PRIORITY JOURNAL; TRANSMISSION ELECTRON MICROSCOPY;

EID: 33947595139     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/17/015     Document Type: Article

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