Silicon-induced DNA damage pathway and its modulation by titanium plasma immersion ion implantation

Biomaterials

Volumn 29, Issue 5, 2008, Pages 544-550

  Jiang, Jiang ^a,b   Huo, Kaifu ^a,c   Wu, Zhengwei ^a   Chen, Shaopeng ^a,b   Pu, Shihao ^a,d   Yu, Zengliang ^b   Liu, Xuanyong ^a,e   Chu, Paul K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b INSTITUTE OF PLASMA PHYSICS   (China)

^c WUHAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^d SOUTHWESTERN INSTITUTE OF PHYSICS   (China)

^e SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

Biocompatibility; DNA double strand breaks; Micronuclei; Plasma immersion ion implantation; Si wafers; Titanium

Indexed keywords

BINDING ENERGY; BIOCOMPATIBILITY; ION IMPLANTATION; SILICON WAFERS;

CELLULAR DNA DAMAGES; CHINESE HAMSTER OVARY (CHO) CELLS; GENOTOXICITY; MICRONUCLEI TESTS; SURFACE BIOCOMPATIBILITY;

DNA;

BIOMATERIAL; OXYGEN; SILICON; SILICON DIOXIDE; TITANIUM;

ANIMAL CELL; ARTICLE; BIOCOMPATIBILITY; CELL LINE; CHO CELL; DNA DAMAGE; DNA STRAND BREAKAGE; FEMALE; MICRONUCLEUS TEST; NONHUMAN; OXYGEN AFFINITY; PRIORITY JOURNAL;

ANIMALS; CHO CELLS; CRICETINAE; CRICETULUS; DNA DAMAGE; IONS; MICROSCOPY, ATOMIC FORCE; SILICON; SPECTRUM ANALYSIS; SURFACE PROPERTIES; TITANIUM;

CRICETULUS GRISEUS;

EID: 36148980087     PISSN: 01429612     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.biomaterials.2007.10.013     Document Type: Article

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