Formation of apatite on hydrogenated amorphous silicon (a-Si:H) film deposited by plasma-enhanced chemical vapor deposition

Materials Chemistry and Physics

Volumn 101, Issue 1, 2007, Pages 124-128

  Liu, Xuanyong ^a,b   Chu, Paul K ^b   Ding, Chuanxian ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

a Si:H film; Apatite; PECVD; Simulated body fluid

Indexed keywords

BIOSENSORS; BODY FLUIDS; CHEMICAL BONDS; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SILANES; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS SILICON FILMS; APATITE; CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (XTEM); SIMULATED BODY FLUIDS; SURFACE BIOACTIVITY;

AMORPHOUS FILMS;

EID: 33751418455     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2005.10.035     Document Type: Article

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