SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 157, Issue 1, 2010, Pages

Effect of phosphorus and carbon incorporation in amorphous cobalt films prepared by chemical vapor deposition

(2) Henderson, Lucas B a Ekerdt, John G a

a The University of Texas at Austin (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON INCORPORATION; COBALT CARBIDES; COBALT FILM; DEPOSITION TEMPERATURES; FILM MICROSTRUCTURES; FILM RESISTIVITY; THERMAL STABILITY; TRIMETHYLPHOSPHINES;

AMORPHOUS ALLOYS; AMORPHOUS CARBON; CARBIDES; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; COBALT; COBALT COMPOUNDS; MICROSTRUCTURE; PHOSPHORUS; SILICON COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 72249107319 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3251283 Document Type: Article

Times cited : (17)

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