Low temperature chemical vapor deposition of Co thin films from Co 2(CO)8

Thin Solid Films

Volumn 485, Issue 1-2, 2005, Pages 95-100

  Ye, D X ^a   Pimanpang, S ^a   Jezewski, C ^b   Tang, F ^a   Senkevich, J J ^a   Wang, G C ^a   Lu, T M ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

Chemical vapor deposition; Cobalt thin film; Dicobalt octacarbonyl; X ray photoelectron spectroscopy

Indexed keywords

CARBON NANOTUBES; CATALYSTS; CHEMICAL VAPOR DEPOSITION; COBALT COMPOUNDS; DECOMPOSITION; FILM GROWTH; LOW TEMPERATURE EFFECTS; SEMICONDUCTOR DEVICES; SURFACE REACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

COBALT THIN FILMS; DICOBALT OCTACARBONYL; GROWTH RATE; VOLATILITY;

THIN FILMS;

EID: 21244442214     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.03.046     Document Type: Article

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