Effect of carbon content on thermal stability of Ti-Cx-Ny thin films

Journal of Materials Research

Volumn 23, Issue 3, 2008, Pages 671-678

  Lu, Yong Hao ^a   Shen, Y G ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COMPOSITION EFFECTS; COMPRESSIVE STRESS; CRYSTAL MICROSTRUCTURE; MAGNETRON SPUTTERING; MICROHARDNESS; NANOCOMPOSITES; NANOCRYSTALLINE MATERIALS; REACTIVE SPUTTERING; RESIDUAL STRESSES; THERMODYNAMIC STABILITY; THIN FILMS;

DIRECT-CURRENT MAGNETRON SPUTTERING; STRUCTURAL STABILITY; UNBALANCED SPUTTERING;

TITANIUM ALLOYS;

EID: 41449102805     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2008.0082     Document Type: Article

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