|
Volumn 219, Issue 1-2, 2003, Pages 136-142
|
UHV/CVD growth of Co on Si(0 0 1) using cobalt carbonyl
|
Author keywords
Cobalt; Sticking coefficient; Thermal desorption
|
Indexed keywords
CHEMICAL VAPOR DEPOSITION;
COBALT;
COBALT COMPOUNDS;
DESORPTION;
GRAIN GROWTH;
HIGH TEMPERATURE EFFECTS;
MASS SPECTROMETRY;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SURFACE REACTIONS;
X RAY DIFFRACTION ANALYSIS;
STICKING COEFFICIENTS;
CRYSTAL GROWTH;
|
EID: 0042363341
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(03)00597-X Document Type: Conference Paper |
Times cited : (7)
|
References (18)
|