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Volumn 219, Issue 1-2, 2003, Pages 136-142

UHV/CVD growth of Co on Si(0 0 1) using cobalt carbonyl

Author keywords

Cobalt; Sticking coefficient; Thermal desorption

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COBALT; COBALT COMPOUNDS; DESORPTION; GRAIN GROWTH; HIGH TEMPERATURE EFFECTS; MASS SPECTROMETRY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SURFACE REACTIONS; X RAY DIFFRACTION ANALYSIS;

EID: 0042363341     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00597-X     Document Type: Conference Paper
Times cited : (7)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.