메뉴 건너뛰기




Volumn 19, Issue 20, 2009, Pages 3243-3253

Fabrication of flexible binary amplitude masks for patterning on highly curved surfaces

Author keywords

[No Author keywords available]

Indexed keywords

3D GEOMETRY; BINARY AMPLITUDE MASK; CHEMICAL ETCHING; CURRENT FABRICATION; CURVED SURFACES; CYLINDRICAL SURFACE; DISTORTION COMPENSATION; GRID PATTERN; HIGH-THROUGHPUT; IMAGE CONTRASTS; LARGE STRAINS; LED ARRAYS; LITHOGRAPHIC PATTERNS; MASK FABRICATION; MATRIX; MICROFLUIDIC PATTERNING; NON-PLANAR SUBSTRATES; PHOTOLITHOGRAPHIC PATTERNING; POLYDIMETHYLSILOXANE PDMS; RETINAL IMPLANTS; SIGNIFICANT PATTERNS; SOFT LITHOGRAPHY; UV-OZONE; WIDE-FIELD;

EID: 70350443257     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.200900978     Document Type: Article
Times cited : (25)

References (80)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.