Femtosecond laser ablation of thin films for the fabrication of binary photomasks

Journal of Micromechanics and Microengineering

Volumn 12, Issue 6, 2002, Pages 775-779

  Venkatakrishnan, K ^a   Stanley, P ^a   Lim, L E N ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

LASER ABLATION; MASKS; PHOTOLITHOGRAPHY; SCANNING; THIN FILMS; ULTRASHORT PULSES;

ACOUSTO-OPTIC SCANNING SYSTEM; FEMTOSECOND LASER ABLATION; HIGH PULSE REPETITION RATE; MICROFABRICATION;

PULSED LASER APPLICATIONS;

EID: 0036851952     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/12/6/308     Document Type: Article

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