Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field

Applied Physics Letters

Volumn 70, Issue 20, 1997, Pages 2658-2660

  Rogers, John A ^a   Paul, Kateri E ^a   Jackman, Rebecca J ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000509354     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118988     Document Type: Article

References (17)

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