Dry etching of polydimethylsiloxane for microfluidic systems

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 975-982

  Garra, J ^a,b   Long, T ^b,c   Currie, J ^a,b   Schneider, T ^a,b,c   White, R ^a,b,c   Paranjape, M ^a,b  

^a GEORGETOWN UNIVERSITY   (United States)

^b Georgetown Adv Electronics Lab   (United States)

^c SCIENCE APPLICATIONS INTERNATIONAL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; DRY ETCHING; ELASTOMERS; FLUORINE; MASKS; OPTICAL MICROSCOPY; PHOTORESISTS; PRESSURE; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE ROUGHNESS;

ANISOTROPIC ETCHING; MICROFLUIDIC SYSTEMS; SILICONE ELASTOMER POLYDIMETHYLSILOXANE;

SILICONES;

EID: 0036565073     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1460896     Document Type: Article

References (7)