Additive soft-lithographic patterning of submicrometer- and nanometer-scale large-area resists on electronic materials

Nano Letters

Volumn 5, Issue 12, 2005, Pages 2533-2537

  Ahn, Heejoon ^a,b   Lee, Keon Jae ^b   Shim, Anne ^c   Rogers, John A ^a,b,d   Nuzzo, Ralph G ^a,b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

^c DOW CORNING CORPORATION   (United States)

^d Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVE SOFT-LITHOGRAPHIC PATTERNING; LATENT IMAGE; ORGANIC PLANARAZATION LAYER; ULTRATHIN POLY(DIMETHYLSILOXANE);

IMAGE PROCESSING; LITHOGRAPHY; MULTILAYERS; NANOSTRUCTURED MATERIALS; POLYMERS; REACTIVE ION ETCHING; SUBSTRATES;

ADDITIVES;

BAYSILON; DIMETICONE; NANOMATERIAL; SILICON DIOXIDE; SILICONE DERIVATIVE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CRYSTALLIZATION; ELECTRONICS; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOGRAPHY; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; DIMETHYLPOLYSILOXANES; ELECTRONICS; MEMBRANES, ARTIFICIAL; MINIATURIZATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOGRAPHY; SILICON DIOXIDE; SILICONES; SURFACE PROPERTIES;

EID: 30644469277     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl051894u     Document Type: Article

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