Laser writing techniques for photomask fabrication using a femtosecond laser

Applied Physics A: Materials Science and Processing

Volumn 74, Issue 4, 2002, Pages 493-496

  Venkatakrishnan, K ^a   Ngoi, B K A ^a   Stanley, P ^a   Lim, L E N ^a   Tan, B ^a   Sivakumar, N R ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; LASER APPLICATIONS; MICROSTRUCTURE; NEODYMIUM LASERS; PHOTORESISTS;

FEMTOSECOND LASERS;

MASKS;

EID: 0036535139     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390101030     Document Type: Article

References (13)