Single step direct-write photomask made from bimetallic Bi/In thermal resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4977, Issue , 2003, Pages 257-268

  Chapman, Glenn ^a   Tu, Yuqiang ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Bimetallic thin film; Direct write photomask; Thermal resist

Indexed keywords

BIMETALS; DENSITY (OPTICAL); HIGH ENERGY LASERS; METALLIC FILMS; PHOTORESISTS;

BIMETALLIC THIN FILM; DIRECT WRITE PHOTOMASK; THERMAL RESIST;

MASKS;

EID: 0344982225     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.479415     Document Type: Conference Paper

References (18)

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