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Volumn 8, Issue 7, 1996, Pages 1558-1567

Micromolding of Polymers in Capillaries: Applications in Microfabrication

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EID: 0011871542     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm9602196     Document Type: Article
Times cited : (150)

References (41)
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    • Reviews: Kloosterboer, J. G.; Lippits, G. J. M.; Meinders, H. C. Philips Tech. Rev. 1982, 40, 298. Crivello, J. V. Annu. Rev. Mater. Sci. 1983, 13, 173.
    • (1983) Annu. Rev. Mater. Sci. , vol.13 , pp. 173
    • Crivello, J.V.1
  • 8
  • 13
    • 0020219292 scopus 로고
    • Academic Press: New York
    • Micromolding/replication: Van Rijsewijjk, H.; Legierse, P. E. J.; Thomas, G. E. Philips Tech. Rev. 1982, 40, 287. Hutley, M. C. Diffraction Gratings; Academic Press: New York, 1982.
    • (1982) Diffraction Gratings
    • Hutley, M.C.1
  • 14
    • 0012493263 scopus 로고
    • Polymerization in the pores of membranes: Martin, C. M. Acc. Chem. Res. 1995, 28, 61. Hoyer, P.; Baba, N.; Masuda, H. Appl. Phys. Lett. 1995, 66, 2700.
    • (1995) Acc. Chem. Res. , vol.28 , pp. 61
    • Martin, C.M.1
  • 15
    • 36448999283 scopus 로고
    • Polymerization in the pores of membranes: Martin, C. M. Acc. Chem. Res. 1995, 28, 61. Hoyer, P.; Baba, N.; Masuda, H. Appl. Phys. Lett. 1995, 66, 2700.
    • (1995) Appl. Phys. Lett. , vol.66 , pp. 2700
    • Hoyer, P.1    Baba, N.2    Masuda, H.3
  • 18
    • 0142037327 scopus 로고
    • Embossing: Emmelius, M.; Pawlowski, G.; Vollmann, H. W. Angew. Chem., Int. Ed. Engl. 1989, 28, 1445. Chou, S. Y.; Krauss, P. R.; Renstrom, P. J. Appl. Phys. Lett. 1995, 67, 3114.
    • (1995) Appl. Phys. Lett. , vol.67 , pp. 3114
    • Chou, S.Y.1    Krauss, P.R.2    Renstrom, P.J.3
  • 36
    • 85033820254 scopus 로고    scopus 로고
    • note
    • 2), and P is the pressure (∼80 mTorr). The distance between the mask and the substrate must be less than 0.3 μm in order to form patterned features of gold using this procedure.
  • 37
    • 85033827823 scopus 로고    scopus 로고
    • note
    • Note that forming patterned features on recessed regions having dimensions of < 100 μm can not be achieved by photolithography and microcontact printing (μCP).


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