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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 1, 1998, Pages 59-68

Generating ∼90 nanometer features using near-field contact-mode photolithography with an elastomeric phase mask

(4) Rogers, John A a Paul, Kateri E a Jackman, Rebecca J a Whitesides, George M a

a HARVARD UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11644312704 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.589836 Document Type: Article

Times cited : (118)

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