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Volumn 12, Issue 6, 2002, Pages 747-758

Fabrication of two-dimensional arrays of microlenses and their applications in photolithography

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; GLASS; IMAGE QUALITY; LENSES; MICROLENSES; PHOTORESISTS; SILICONES; SUBSTRATES;

EID: 0036851058     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/12/6/305     Document Type: Article
Times cited : (84)

References (23)
  • 3
    • 0018434189 scopus 로고    scopus 로고
    • Close-up imaging of documents and displays with lens arrays
    • Anderson R H 1997 Close-up imaging of documents and displays with lens arrays Appl. Opt. 18 477
    • (1997) Appl. Opt. , vol.18 , pp. 477
    • Anderson, R.H.1
  • 5
    • 0000519748 scopus 로고    scopus 로고
    • Chromatic confocal microscopy with microlenses
    • Tiziani H J, Achi R and Kramer R N 1996 Chromatic confocal microscopy with microlenses J. Mod. Opt. 43 155
    • (1996) J. Mod. Opt. , vol.43 , pp. 155
    • Tiziani, H.J.1    Achi, R.2    Kramer, R.N.3
  • 6
    • 0032596881 scopus 로고    scopus 로고
    • Real-time confocal two-photon fluorescence microscope using a rotating microlens array
    • Fujita K, Kaneko T, Nakamura O, Oyamada M, Takamatsu T and Kawata S 1999 Real-time confocal two-photon fluorescence microscope using a rotating microlens array Proc. SPIE 3740 390
    • (1999) Proc. SPIE , vol.3740 , pp. 390
    • Fujita, K.1    Kaneko, T.2    Nakamura, O.3    Oyamada, M.4    Takamatsu, T.5    Kawata, S.6
  • 7
    • 0035896836 scopus 로고    scopus 로고
    • Fabrication of arrays of two-dimensional micropatterns using microspheres as microlenses for projection photolithography
    • Wu M-H and Whitesides G M 2001 Fabrication of arrays of two-dimensional micropatterns using microspheres as microlenses for projection photolithography Appl. Phys. Lett. 78 2273
    • (2001) Appl. Phys. Lett. , vol.78 , pp. 2273
    • Wu, M.-H.1    Whitesides, G.M.2
  • 8
    • 0036575430 scopus 로고    scopus 로고
    • Patterning flood illumination using microlens arrays
    • Wu M-H and Whitesides G M 2002 Patterning flood illumination using microlens arrays Appl. Opt. 41 2575
    • (2002) Appl. Opt. , vol.41 , pp. 2575
    • Wu, M.-H.1    Whitesides, G.M.2
  • 10
    • 0034245602 scopus 로고    scopus 로고
    • Surface profiles of reflow microlenses under the influence of surface tension
    • Schilling A, Merz R, Ossmann C and Herzig H P 2000 Surface profiles of reflow microlenses under the influence of surface tension Opt. Eng. 39 2171
    • (2000) Opt. Eng. , vol.39 , pp. 2171
    • Schilling, A.1    Merz, R.2    Ossmann, C.3    Herzig, H.P.4
  • 11
    • 0028483432 scopus 로고
    • Self-organization of organic liquids on patterned self-assembled monolayers of alkanethiolates on gold
    • Biebuyck H A and Whitesides G M 1994 Self-organization of organic liquids on patterned self-assembled monolayers of alkanethiolates on gold Langmuir 10 2790
    • (1994) Langmuir , vol.10 , pp. 2790
    • Biebuyck, H.A.1    Whitesides, G.M.2
  • 12
    • 0032620401 scopus 로고    scopus 로고
    • Microlens formation by thin-film deposition with mesh-shaped masks
    • Grunwald R, Mischke H and Rehak W 1999 Microlens formation by thin-film deposition with mesh-shaped masks Appl. Opt. 38 4117
    • (1999) Appl. Opt. , vol.38 , pp. 4117
    • Grunwald, R.1    Mischke, H.2    Rehak, W.3
  • 13
    • 0038591780 scopus 로고    scopus 로고
    • General aspheric refractive micro-optics fabricated by optical lithography using a high energy beam sensitive glass gray-level mask
    • Däschner W, Long P, Stein R, Wu C and Lee S H 1996 General aspheric refractive micro-optics fabricated by optical lithography using a high energy beam sensitive glass gray-level mask J. Vac. Sci. Technol. B 14 3730
    • (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 3730
    • Däschner, W.1    Long, P.2    Stein, R.3    Wu, C.4    Lee, S.H.5
  • 14
    • 0000403115 scopus 로고    scopus 로고
    • Investigation of integrated diffractive/refractive microlens microfabricated by focused ion beam
    • Fu Y and Bryan N K A 2000 Investigation of integrated diffractive/refractive microlens microfabricated by focused ion beam Rev. Sci. Instrum. 71 2263
    • (2000) Rev. Sci. Instrum. , vol.71 , pp. 2263
    • Fu, Y.1    Bryan, N.K.A.2
  • 15
    • 8944257381 scopus 로고    scopus 로고
    • Complex optical surfaces formed by replica molding against elastomeric masters
    • Xia Y, Kim E, Zhao X-M, Rogers J A, Prentiss M and Whitesides G M 1996 Complex optical surfaces formed by replica molding against elastomeric masters Science 273 347
    • (1996) Science , vol.273 , pp. 347
    • Xia, Y.1    Kim, E.2    Zhao, X.-M.3    Rogers, J.A.4    Prentiss, M.5    Whitesides, G.M.6
  • 16
    • 0032049273 scopus 로고    scopus 로고
    • Imaging profiles of light intensity in the near field: Applications to phase-shift photolithography
    • Aizenberg J, Rogers J A, Paul K E and Whitesides G M 1998 Imaging profiles of light intensity in the near field: applications to phase-shift photolithography Appl. Opt. 37 2145
    • (1998) Appl. Opt. , vol.37 , pp. 2145
    • Aizenberg, J.1    Rogers, J.A.2    Paul, K.E.3    Whitesides, G.M.4
  • 17
    • 0000509354 scopus 로고    scopus 로고
    • Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field
    • Rogers J A, Paul K E, Jackman R J and Whitesides G M 1997 Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field Appl. Phys. Lett. 70 2658
    • (1997) Appl. Phys. Lett. , vol.70 , pp. 2658
    • Rogers, J.A.1    Paul, K.E.2    Jackman, R.J.3    Whitesides, G.M.4
  • 19
    • 79956022836 scopus 로고    scopus 로고
    • Fabrication of frequency selective surfaces using microlens projection photolithography
    • Wu M-H, Paul K E, Yang J and Whitesides G M 2002 Fabrication of frequency selective surfaces using microlens projection photolithography Appl. Phys. Lett. 80 3500
    • (2002) Appl. Phys. Lett. , vol.80 , pp. 3500
    • Wu, M.-H.1    Paul, K.E.2    Yang, J.3    Whitesides, G.M.4
  • 20
    • 0020270194 scopus 로고
    • Proximity effects and influences of nonuniform illumination in projection lithography
    • Robertson P D, Wise F W, Nasr A N, Neureuther A R and Ting C H 1982 Proximity effects and influences of nonuniform illumination in projection lithography Proc. SPIE 334 37
    • (1982) Proc. SPIE , vol.334 , pp. 37
    • Robertson, P.D.1    Wise, F.W.2    Nasr, A.N.3    Neureuther, A.R.4    Ting, C.H.5
  • 21
    • 0034206232 scopus 로고    scopus 로고
    • Optical proximity correction by gray tone photolithography
    • Cui Z, Du J, Huang Q, Su J and Guo Y 2000 Optical proximity correction by gray tone photolithography Microelectron. Eng. 53 153
    • (2000) Microelectron. Eng. , vol.53 , pp. 153
    • Cui, Z.1    Du, J.2    Huang, Q.3    Su, J.4    Guo, Y.5
  • 22
    • 0011527905 scopus 로고    scopus 로고
    • New microlithography technique for large size field emission displays
    • Ida M, Montmayeul B and Meyer R 1996 New microlithography technique for large size field emission displays Euro Display '96 p 177
    • (1996) Euro Display '96 , pp. 177
    • Ida, M.1    Montmayeul, B.2    Meyer, R.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.