Electron-beam fabrication of nonplanar templates for contact printing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3569-3571

  Rhee, K W ^a,c   Shirey, L M ^a   Isaacson, P I ^a   Kornegay, C F ^a   Dressick, W J ^b   Chen, M S ^b   Brandow, S L ^b  

^a Electronics Sci and Technol Div   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

^c SFA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS; POLYMETHYL METHACRYLATES; PRINTED CIRCUITS; REACTIVE ION ETCHING;

CONTACT PRINTING; NONPLANAR TEMPLATES; QUARTZ LENS BLANKS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034315954     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319704     Document Type: Article

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