Moore's law past 32nm: Future challenges in device scaling

Proceedings - 2009 13th International Workshop on Computational Electronics, IWCE 2009

Volumn , Issue , 2009, Pages

  Kuhn, Kelin J ^a  

^a INTEL CORPORATION   (United States)

Author keywords

CMOS; High k; Metal gate; Orientation; Strain

Indexed keywords

32 NM TECHNOLOGY; CHANNEL ORIENTATIONS; CMOS; DEVICE-SCALING; FUTURE CHALLENGES; HIGH-K; METAL-GATE; MOORE'S LAW; MULTIPLE GATES; NEW SOLUTIONS; ORIENTATION; PROCESS GENERATION;

ELECTRONICS ENGINEERING;

IONIC CONDUCTION;

EID: 70350241407     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IWCE.2009.5091124     Document Type: Conference Paper

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