Embedded SiGe S/D PMOS on thin body SOI substrate with drive current enhancement

Digest of Technical Papers - Symposium on VLSI Technology

Volumn 2005, Issue , 2005, Pages 26-27

  Zhang, D ^a   Nguyen, B Y ^a   White, T ^a   Goolsby, B ^a   Nguyen, T ^a   Dhandapani, V ^a   Hildreth, J ^a   Foisy, M ^a   Adams, V ^a   Shiho, Y ^a   Thean, A ^a   Theodore, D ^a   Canonico, M ^a   Zollner, S ^a   Bagchi, S ^a   Murphy, S ^a   Rai, R ^a   Jiang, J ^a   Jahanbani, M ^a   Noble, R ^a   Zavala, M ^a   Cotton, R ^a   Eades, D ^a   Parsons, S ^a   Montgomery, P ^a   Martinez, A ^a   Winstead, B ^a   Mendicino, M ^a   Cheek, J ^a   Liu, J ^a   Grudowski, P ^a   Ranami, N ^a   Tomasini, P ^b   Arena, C ^b   Werkhoven, C ^b   Kirby, H ^b   Chang, C H ^c   Lin, C T ^c   Tuan, H C ^c   See, Y C ^c   Venkatesan, S ^a   Kolagunta, V ^a   Cave, N ^a   Mogab, J ^a   more..

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b ASM   (United States)

^c TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE INTEGRATION; DRAIN CURRENT; IN-SITU BORON;

BORON; EMBEDDED SYSTEMS; MOS DEVICES; SATURATION (MATERIALS COMPOSITION); SEMICONDUCTOR DOPING; SILICON ON INSULATOR TECHNOLOGY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 27744475710     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2005.1469198     Document Type: Conference Paper

References (3)

1. T. Ghani et al., IEDM Tech. Dig., p. 978 (2003).
2. M. Ozturk et. al., IEDM Tech. Dig., p. 497 (2003).
3. P.R. Chidambaram et al., VLSI Symp. Proceedings, p. 48 (2004).