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Volumn 37, Issue 9 SPEC. ISS. PART 1, 2009, Pages 1705-1714

Nanoscale roughness effects at the interface of lithography and plasma etching: Modeling of line-edge-roughness transfer during plasma etching

Author keywords

Etching; Modeling; Plasma materials processing applications; Rough surfaces

Indexed keywords

3-D MODELING; CORRELATION LENGTHS; INCIDENT IONS; ISOTROPIC ETCHING; LINE EDGE ROUGHNESS; MODELING; NANO-SCALE ROUGHNESS; PATTERN TRANSFER PROCESS; PATTERN TRANSFERS; PLASMA MATERIALS-PROCESSING APPLICATIONS; PLASMA PROCESS; RANDOM FRACTALS; RELATIVE REDUCTION; RMS ROUGHNESS; ROUGH SURFACES; ROUGHNESS EXPONENT; ROUGHNESS PARAMETERS; TRIMMING PROCESS; TWO LAYERS; UNDERLAYERS;

EID: 70349451684     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2009.2024117     Document Type: Article
Times cited : (21)

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