Modeling the impact of photoresist trim etch process on photoresist surface roughness

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 2, 2003, Pages 655-659

  Rauf, Shahid ^a   Stout, Phillip J ^a   Cobb, Jonathan ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FREQUENCIES; PLASMAS; SPUTTERING; SURFACE ROUGHNESS;

ENERGETIC IONS;

PHOTORESISTS;

EID: 0037276787     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1545735     Document Type: Article

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