Mass spectrometry studies of resist trimming processes in HBr/O 2 and Cl 2O 2 chemistries

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 1, 2005, Pages 103-112

  Pargon, E ^a   Joubert, O ^a   Chevolleau, T ^a   Cunge, G ^a   Xu, Songlin ^b   Lill, Thorsten ^c  

^a CEA LETI   (France)

^b MATTSON THERMAL PRODUCTS GMBH   (United States)

^c APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA CONDITIONS; TRIMMING PROCESSES;

BROMINE COMPOUNDS; CHLORINE COMPOUNDS; CONCENTRATION (PROCESS); DISSOCIATION; EROSION; HYDROGEN; TRIMMING; X RAY PHOTOELECTRON SPECTROSCOPY;

MASS SPECTROMETRY;

EID: 31144442689     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1839915     Document Type: Article

References (11)

1. C.-Y. Sin and B.-H. Chen, J. Vac. Sci. Technol. B 20, 1974 (2002).
2. S. Ramalingam, C. Lee, and V. Vahedi, Semiconductor International., 2002.
3. E. Pargon, O. Joubert, S. Xu, and T. Lill, J. Vac. Sci. Technol. B 22, 1869 (2004).
4. E. Pargon, N. Posseme, O. Joubert, and L. Vallier, J. Vac. Sci. Technol. B 22, 1858 (2004).
5. G. Cunge, R. L. Inglebert, O. Joubert, L. Vallier, and N. Sadeghi, J. Vac. Sci. Technol. B 20, 2137 (2002).
6. S. Ma, M. Jain, and J. D. Chinn, J. Vac. Sci. Technol. A 16, 1440 (1998).
7. A. Tserepi, W. Schwarzenbach, J. Derouard, and N. Sadeghi, J. Vac. Sci. Technol. A 15, 3120 (1997).
8. G. Cunge, R. L. Inglebert, O. Joubert, and L. Vallier, J. Vac. Sci. Technol. B 20, 2137 (2002).
9. H. Singh, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 18, 299 (2000).
10. H. Singh, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 17, 2447 (2000).
11. R. Foest, J. K. Olthoff, R. J. Van Brunt, E. C. Benck, and J. R. Roberts, Phys. Rev. E 54, 1876 (1996).