Experimental and theoretical studies of the DC reactive magnetron sputtering deposition of silver oxide thin films

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 1282-1286

  Snyders, R ^a   Wautelet, M ^a   Gouttebaron, R ^a   Dauchot, J P ^a   Hecq, M ^a  

^a UNIVERSITY OF MONS   (Belgium)

Author keywords

Mass spectrometry; Model; Reactive sputtering; Silver

Indexed keywords

CONCENTRATION (PROCESS); CORRELATION METHODS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; SILVER COMPOUNDS; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE GAS CONCENTRATION;

COATING TECHNIQUES;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144434247     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00682-0     Document Type: Article

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