High Rate Sputter-Deposition of TiO2 Films Using Oxide Target

IEICE Transactions on Electronics

Volumn E87-C, Issue 2, 2004, Pages 227-231

  Hoshi, Yoichi ^a   Takahashi, Tomoki ^a  

^a TOKYO POLYTECHNIC UNIVERSITY   (Japan)

Author keywords

High rate sputtering; Ion mass analysis; Magnetron sputtering; Oxide target; TiO2 film

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ENERGY GAP; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SPECTROPHOTOMETERS; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS;

HIGH-RATE SPUTTERING; ION MASS ANALYSIS; OXIDE TARGET; TIO2 FILMS;

TITANIUM DIOXIDE;

EID: 1442286977     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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