Measurement of magnesium oxide sputtering yields by He and Ar ions with a low-energy mass-selected ion beam system

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 45-49, 2007, Pages

  Hine, Kiyohiro ^a   Yoshimura, Satoru ^a   Ikuse, Kazumasa ^a   Kiuchi, Masato ^a,b   Hashimoto, Jun ^c   Terauchi, Masaharu ^c   Nishitani, Mikihiko ^c   Hamaguchi, Satoshi ^a  

^a OSAKA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c PANASONIC CORPORATION   (Japan)

Author keywords

Ion beam; Magnesium oxide; Plasma display panel; Quartz crystal microbalance; Sputtering yield

Indexed keywords

ARGON; BEAM PLASMA INTERACTIONS; COMPUTER SIMULATION; ELECTRIC DISCHARGES; ELECTROMAGNETIC WAVES; HELIUM; INERT GASES; ION BEAMS; IONS; LIGHT METALS; MAGNESIUM; MAGNESIUM PRINTING PLATES; OXIDE MINERALS; PLASMA DISPLAY DEVICES; PLASMAS; PLASTIC COATINGS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SPUTTERING;

BARRIER COATINGS; DISCHARGE CHARACTERISTICS; INCIDENT ENERGIES; INCIDENT ENERGY DEPENDENCES; ION BEAM SYSTEMS; MAGNESIUM OXIDE; MAGNESIUM OXIDES; NOBLE GAS IONS; NUMERICAL SIMULATIONS; PDP CELLS; PLASMA DISPLAY PANEL; PLASMA DISPLAY PANELS; QUARTZ CRYSTAL MICROBALANCE; SPUTTERING YIELD; SPUTTERING YIELDS;

ION BOMBARDMENT;

EID: 54049103379     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L1132     Document Type: Article

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