Influence of the plasma chemistry on the composition of ZrOx and NbOx thin films deposited by reactive magnetron sputtering

Plasma Chemistry and Plasma Processing

Volumn 26, Issue 2, 2006, Pages 197-203

  Mráz, Stanislav ^a   Schneider, Jochen M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Magnetron sputtering; Niobia; Plasma chemistry; Thin film composition; Zirconia

Indexed keywords

DISSOCIATION; ENERGY DISSIPATION; MAGNETRON SPUTTERING; NIOBIUM COMPOUNDS; PLASMAS; STOICHIOMETRY; THIN FILMS;

NIOBIA; PLASMA CHEMISTRY; THIN FILM COMPOSITION;

ZIRCONIUM;

EID: 33646453922     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-006-9001-y     Document Type: Article

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