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Volumn 16, Issue 2, 1998, Pages 639-643

High rate reactive dc magnetron sputter deposition of Al2O3 films

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0032379780     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581081     Document Type: Article
Times cited : (46)

References (21)
  • 2
    • 85034279863 scopus 로고
    • Ph.D. thesis, Chalmers University of Technology, Gothenburg, Sweden, (unpublished)
    • M. Halvarsson, Ph.D. thesis, Chalmers University of Technology, Gothenburg, Sweden, 1994 (unpublished).
    • (1994)
    • Halvarsson, M.1
  • 10
    • 11644275689 scopus 로고    scopus 로고
    • edited by S. Rossnagel and A. Ulman Academic, San Diego
    • M. Brett, S. Dew, and T. Smy, in Physics of Thin Films, edited by S. Rossnagel and A. Ulman (Academic, San Diego, 1996), Vol. 22, p. 7.
    • (1996) Physics of Thin Films , vol.22 , pp. 7
    • Brett, M.1    Dew, S.2    Smy, T.3
  • 11
    • 0343286487 scopus 로고
    • edited by R. Behrisch and K. Wittmaack Springer, Berlin
    • W. O. Hofer, in Topics in Applied Physics, edited by R. Behrisch and K. Wittmaack (Springer, Berlin, 1991), Vol. 64, p. 54.
    • (1991) Topics in Applied Physics , vol.64 , pp. 54
    • Hofer, W.O.1
  • 20
    • 85034293737 scopus 로고    scopus 로고
    • U. S. Patent No. 5,656,138 (Aug. 12, 1997)
    • M. A. Scobey and S. L. Bryn, U. S. Patent No. 5,656,138 (Aug. 12, 1997).
    • Scobey, M.A.1    Bryn, S.L.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.