Factors Affecting Profile Evolution in Plasma Etching of SiO2 Modeling and Experimental Verification

Journal of the Electrochemical Society

Volumn 150, Issue 10, 2003, Pages

  La Magna, Antonino ^a   Garozzo, Giuseppe ^b  

^a CNR IMM   (Italy)

^b STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DRY ETCHING; FLUOROCARBONS; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY;

SURFACE MODELS;

SILICA;

EID: 0142053093     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1602084     Document Type: Article

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