Hybrid model for the calculation of ion distribution functions behind a direct current or radio frequency driven plasma boundary sheath

Journal of Applied Physics

Volumn 90, Issue 5, 2001, Pages 2169-2179

  Kratzer, Matthias ^a   Brinkmann, Ralf Peter ^b   Sabisch, Winfried ^a   Schmidt, Harald ^c  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

^c UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039436897     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1389081     Document Type: Article

References (41)

1. P. F. Williams, Plasma Processing of Semiconductors (Kluwer Academic, Dordrecht, 1997).
2. J. W. Coburn, IEEE Trans. Plasma Sci. 19, 1048 (1991).
3. M. Konuma, Film Deposition by Plasma Techniques (Springer, New York, 1992).
4. J. R. Hollahan and A. T. Bell, Techniques and Applications of Plasma Chemistry (Wiley, New York, 1974).
5. J. Hopwood, Plasma Sources Sci. Technol. 1, 109 (1992).
6. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
7. Y. P. Raizer, Gas Discharge Physics (Springer, Berlin, 1991).
8. S. Biehler, Ph.D. thesis, Ruhr-Universität Bochum. Germany, 1991.
9. R. P. Brinkmann, M. Kratzer, and H. Schmidt, Proceedings of the 14th International Symposium on Plasma Chemistry, 1999, Vol. 3, p. 1293.
10. A. D. Kuypers and H. J. Hopman, J. Appl. Phys. 67, 1229 (1990).
11. R. J. M. M. Snijkers et al., Appl. Phys. Lett. 63, 308 (1993).
12. R. J. M. M. Snijkers et al., J. Appl. Phys. 79, 8982 (1996).
13. E. A. Edelberg et al., J. Vac. Sci. Technol. A 17, 506 (1999).
14. J. Janes and W. Pilz, J. Appl. Phys. 74, 649 (1993).
15. J. Janes, J. Vac. Sci. Technol. A 12, 97 (1994).
16. J. Liu, L. Huppert, and H. H. Sawin, J. Appl. Phys. 68, 3916 (1990).
17. M. A. Sobolewski, J. K. Olthoff, and Y. Wang, J. Appl. Phys. 85, 3966 (1999).
18. E. A. Edelberg and E. S. Aydil, J. Appl. Phys. 86, 4799 (1999).
19. A. Fichelscher, I. W. Rangelow, and R. Kassing, Mater. Sci. Eng., A 139, 412 (1991).
20. M. J. Kushner, J. Appl. Phys. 58, 4024 (1985).
21. A. Manenschijn and W. J. Goedheer, J. Appl. Phys. 69, 2923 (1991).
22. D. Field et al., J. Appl. Phys. 70, 82 (1991).
23. W. J. Goedheer and P. M. Meijer, IEEE Trans. Plasma Sci. 19, 245 (1991).
24. M. S. Barnes, J. C. Forster, and J. H. Keller, IEEE Trans. Plasma Sci. 19, 245 (1991).
25. U. Flender and K. Wiesemann, J. Phys. D 27, 509 (1993).
26. K.-U. Riemann, U. Ehlemann, and K. Wiesemann, J. Phys. D 25, 620 (1992).
27. X. X. Zhong et al., J. Appl. Phys. 85, 1351 (1999).
28. D. J. Koch and W. N. G. Hitchon, Phys. Fluids B 1, 2239 (1989).
29. B. E. Thompson and H. H. Sawin, J. Appl. Phys. 63, 2241 (1988).
30. J. Zheng. R. P. Brinkmann, and J. P. McVittie, J. Vac. Sci. Technol. A 13, 859 (1995).
31. K. H. Spatschek, Theoretische Plasmaphysik (Teubner Studienbücher, Stuttgart, 1990).
32. J. A. Hornbeck, Phys. Rev. 84, 615 (1951).
33. H. R. Skullerud, J. Phys. D 1, 1567 (1968).
34. Y. Okamoto and H. Tamagawa, J. Appl. Phys. 29, 187 (1970).
35. W. Aberth and D. C. Lorents, Phys. Rev. 144, 109 (1966).
36. F. B. M. Copeland and D. S. F. Crothers, At. Data Nucl. Data Tables 65, 273 (1997).
37. A. V. Phelps, J. Phys. Chem. Ref. Data 20, 557 (1991).
38. I. Popescu Iovitsu and N. Ionescu-Pallas, Sov. Phys. Tech. Phys. 4, 781 (1960).
39. W. H. Cramer, J. Chem. Phys. 30, 641 (1959).
40. H. W. Ellis et al., At. Data Nucl. Data Tables 17, 177 (1976).
41. D. R. Lyde, CRC Handbook of Chemistry and Physics (Chemical Rubber Corp., Boston, 1991).