|
|
|
Volumn 4 4, Issue 302, 2001, Pages 673-683
|
|
High etch rate, deep anisotropic plasma etching of silicon for MEMS fabrication
a a a a a a
a
NONE
|
|
Author keywords
Anisotropic; Micromachining; Plasma etching; Silicon etching
|
|
Indexed keywords
ANISOTROPY;
DRY ETCHING;
MICROELECTROMECHANICAL DEVICES;
MICROELECTRONIC PROCESSING;
MICROMACHINING;
MICROSENSORS;
PLASMA ETCHING;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICE STRUCTURES;
ANISOTROPIC PLASMA ETCHING;
DEEP PLASMA ETCHING;
DEEP SILICON ETCHING;
SILICON MICROMACHINING;
SEMICONDUCTING SILICON;
|
|
EID: 19644398190
PISSN: 12660167
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
|
Times cited : (1)
|
|
References (14)
|
