Simulation study of micro-loading phenomena in silicon dioxide hole etching

IEEE Transactions on Electron Devices

Volumn 44, Issue 5, 1997, Pages 751-760

  Misaka, Akio ^a   Harafuji, Kenji ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; LOADS (FORCES); MATHEMATICAL MODELS; SIMULATION; SIMULATORS; SURFACE PROPERTIES;

ETCHING SELECTIVITY;

SILICA;

EID: 0031146692     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.568036     Document Type: Article

References (30)

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