Plasma etch profiles of passivated open-area trenches

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 3, 2001, Pages 711-721

  Abraham Shrauner, Barbara ^a  

^a WASHINGTON UNIVERSITY IN ST LOUIS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ION BOMBARDMENT; PASSIVATION; PHOTORESISTS; PLASMAS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICA;

PLASMA ETCH PROFILES;

PLASMA ETCHING;

EID: 0035326370     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1371319     Document Type: Conference Paper

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