Analytical modeling of silicon etch process in high density plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 5, 1999, Pages 2485-2491

  Abdollahi Alibeik, Shahram ^a   McVittie, James P ^a   Saraswat, Krishna C ^a   Sukharev, Valeriy ^b   Schoenborn, Philippe ^b  

^a Stanford University   (United States)

^b AGERE SYSTEMS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033442835     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581986     Document Type: Article

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