Feature profile evolution simulation using a level set method

Journal of the Electrochemical Society

Volumn 146, Issue 5, 1999, Pages 1889-1894

  Hwang, Helen H ^a   Govindan, T R ^b   Meyyappan, M ^b  

^a Thermosciences Institute   (United States)

^b NASA AMES RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CHLORINE; COMPUTER SIMULATION; DEPOSITION; MATHEMATICAL MODELS; PLASMAS; REACTIVE ION ETCHING;

LEVEL SET METHOD;

SEMICONDUCTING SILICON;

EID: 0032665802     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391861     Document Type: Article

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