Atomic layer deposition of tungsten disulphide solid lubricant thin films

Journal of Materials Research

Volumn 19, Issue 12, 2004, Pages 3443-3446

  Scharf, T W ^a   Prasad, S V ^a   Mayer, T M ^a   Goeke, R S ^a   Dugger, M T ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; FILM GROWTH; HYDROGEN SULFIDE; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SILICON; SOLID LUBRICANTS; SURFACE PHENOMENA; SYNTHESIS (CHEMICAL); THIN FILMS;

ATOMIC LAYER DEPOSITION; GAS PRECURSORS; TUNGSTEN DISULPHIDE; TUNGSTEN FLUORIDE;

TUNGSTEN COMPOUNDS;

EID: 12844250786     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2004.0459     Document Type: Article

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