메뉴 건너뛰기




Volumn 492, Issue 1-2, 2005, Pages 6-12

Layer-by-layer deposition of zirconium oxide films from aqueous solutions for friction reduction in silicon-based microelectromechanical system devices

Author keywords

Atomic force microscopy; Organometallic vapour deposition; Oxide; X ray photoelectron diffraction

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; COATINGS; DEPOSITION; FRICTION; MICROELECTROMECHANICAL DEVICES; ORGANOMETALLICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE ROUGHNESS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA;

EID: 25644439795     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.06.014     Document Type: Article
Times cited : (16)

References (46)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.