Layer-by-layer deposition of zirconium oxide films from aqueous solutions for friction reduction in silicon-based microelectromechanical system devices

Thin Solid Films

Volumn 492, Issue 1-2, 2005, Pages 6-12

  Liu, Jun Fu ^a,c   Nistorica, Corina ^a   Gory, Igor ^a   Skidmore, George ^a   Mantiziba, Fadziso M ^b   Gnade, Bruce E ^b  

^a ZYVEX CORPORATION   (United States)

^b The University of Texas at Dallas   (United States)

^c University of New Hampshire   (United States)

Author keywords

Atomic force microscopy; Organometallic vapour deposition; Oxide; X ray photoelectron diffraction

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; COATINGS; DEPOSITION; FRICTION; MICROELECTROMECHANICAL DEVICES; ORGANOMETALLICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE ROUGHNESS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA;

IONIC LAYERS; LAYER-BY-LAYER DEPOSITION; ORGANOMETALLIC VAPOR DEPOSITION; X-RAY PHOTOELECTRON DIFFRACTION;

SILICON;

EID: 25644439795     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.06.014     Document Type: Article

References (46)

1. K. Izumi, M. Murakami, T. Deguchi, and A. Morita J. Am. Ceram. Soc. 72 1989 1465
2. G.D. Wilk, R.M. Wallace, and J.M. Anthony J. Appl. Phys. 89 2001 5243
3. M.J. Biercuk, D.J. Monsma, C.M. Marcus, J.S. Becker, and R.G. Gordon Appl. Phys. Lett. 83 2003 2405
4. D.H. Kuo, and C.H. Chien Thin Solid Films 429 2003 40
5. A.S. Kao, and C. Hwang J. Vac. Sci. Technol., A, Vac. Surf. Films 8 1990 3289
6. M. Shane, and M.L. McCartney J. Mater. Sci. 25 1990 1537
7. A.S. Kao, and G.L. Gorman J. Appl. Phys. 67 1990 3826
8. M. Agarwal, M.R. De Guire, and A.H. Heuer J. Am. Ceram. Soc. 80 1997 2967
9. B. Basu, R.G. Vitchev, J.P. Cellis, and O.V. Der Biest Acta Mater. 48 2000 2461
10. T.E. Fischer, M.P. Anderson, S. Jahanmir, and R. Saher Wear 124 1988 133
11. W. Morales, and D.H. Buckley Wear 123 1988 345
12. M. Houssa, A. Stesmans, M. Naili, and M.M. Heyns Appl. Phys. Lett. 77 2000 1381
13. M. Copel, M. Gribelyuk, and E. Gusev Appl. Phys. Lett. 76 2000 436
14. M.A. Cameron, and S.M. George Thin Solid Films 348 1999 90
15. D.M. Hausmann, E. Kim, J. Becker, and R.G. Gordon Chem. Mater. 14 2002 4350
16. J.P. Chang, Y.-S. Lin, S. Berger, A. Kepten, R. Bloom, and S. Levy J. Vac. Sci. Technol., B 19 2001 2137
17. M.A. Boorst, W.Y. Lee, Y. Zhang, and P.K. Liaw J. Am. Ceram. Soc. 30 1997 1591
18. P. Yashar, J. Rechner, M.S. Wong, W.D. Sproul, and S.A. Barnett Surf. Coat. Technol. 333 1997 94
19. L.S. Wang, and S.A. Barnett J. Electrochem. Soc. 139 1992 1134
20. T. Niesen, M.R. De Guire, J. Bill, F. Aldinger, M. Ruhle, A. Fischer, F.C. Jentoft, and R. Schlogl J. Mater. Res. 14 1999 2464
21. Y. Gao, Y. Masuda, H. Ohta, and K. Koumoto Chem. Mater. 16 2004 1702
22. H. Shin, M. Agarwal, and M.R. De Guire Acta Mater. 46 1998 801
23. A.D. Poli, T. Wagner, A. Fischer, G. Weinberg, F.C. Jentoft, R. Schlogl, and M. Ruhle Thin Solid Films 379 2000 122
24. T. Yao, T. Inui, and A. Ariyoshi J. Am. Ceram. Soc. 79 1996 3329
25. T. Yao J. Mater. Res. 13 1998 1091
26. M. Shane, and M.L. McCartney J. Mater. Sci. 25 1990 1537
27. Y. Yu, X. Wang, Y. Cao, and X. Hu Appl. Surf. Sci. 72 2001 260
28. J.F. Quinson, C. Chino, A.M. De Becdelievre, C. Guizard, and M. Brunel J. Mater. Sci. 31 1996 5179
29. T.P. Niesen, and M.R. De Guire Solid State Ionics 151 2002 61
30. M. Yoshimura, W.L. Suchanek, and K. Byrappa MRS Bull. 25 2000 17
31. T. Niesen, and M.R. De Gure J. Electroceram. 6 2001 169
32. S. Park, B.L. Clark, D.A. Keszler, J.P. Bender, J.F. Wager, T.A. Reynolds, and G.S. Herman Science 297 2002 65
33. R.J. Collins, and N.S. Chaim Langmuir 11 1995 2322
34. W. Qi, R. Nieh, B.H. Lee, L. Kang, Y. Jeon, K. Onish, T. Ngai, S. Banerjee, and J.C. Lee IEEE Proceeding Technical Digest 1999 145
35. C. Huang, Z. Tong, and Z. Zhang J. Am. Ceram. Soc. 84 2001 1637
36. B.-O. Cho, S. Lao, L. Sha, and J.P. Chang J. Vac. Sci. Technol., A, Vac. Surf. Films 19 2001 2751
37. G. Alberti, U. Costantino, G. Marletta, O. Puglisi, and S. Pignataro J. Inorg. Nucl. Chem. 43 1981 3329
38. J. Sefcik, and A.V. McCormick Catal. Today 35 1997 205
39. J.J. Chambers, and G.N. Parsons Appl. Phys. Lett. 77 2000 2385
40. G. Lucovsky, G.B. Rayner, D. Kang, G. Appel, R.S. Johnson, Y. Zhang, D.E. Ade, H. Sayers, and J.L. Whitten Appl. Phys. Lett. 79 2001 1775
41. M.J. Guittet, J.P. Crocombette, and M. Gautier-Soyer Phys. Rev., B 63 2001 125117
42. R.K. Iler The Chemistry of Silica 1979 Wiley New York
43. K.N.G. Fuller, and D. Tabor Proc. R. Soc. Lond., A 345 1975 327
44. D. Maugis J. Adhes. Sci. Technol. 10 1996 161
45. B. Bhushan Principles and Applications of Tribology 2002 Wiley NewYork
46. B. Bhushan J. Vac. Sci. Technol., B 21 2003 2262