![]() |
Volumn 492, Issue 1-2, 2005, Pages 6-12
|
Layer-by-layer deposition of zirconium oxide films from aqueous solutions for friction reduction in silicon-based microelectromechanical system devices
|
Author keywords
Atomic force microscopy; Organometallic vapour deposition; Oxide; X ray photoelectron diffraction
|
Indexed keywords
ADSORPTION;
ATOMIC FORCE MICROSCOPY;
COATINGS;
DEPOSITION;
FRICTION;
MICROELECTROMECHANICAL DEVICES;
ORGANOMETALLICS;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SURFACE ROUGHNESS;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
ZIRCONIA;
IONIC LAYERS;
LAYER-BY-LAYER DEPOSITION;
ORGANOMETALLIC VAPOR DEPOSITION;
X-RAY PHOTOELECTRON DIFFRACTION;
SILICON;
|
EID: 25644439795
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2005.06.014 Document Type: Article |
Times cited : (16)
|
References (46)
|