Structure and morphology evolution of ALN films grown by DC sputtering

Surface and Coatings Technology

Volumn 180-181, Issue , 2004, Pages 140-144

  Auger, M A ^a   Vazquez L ^a   Jergel, M ^b   Sanchez O ^a   Albella, J M ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b INSTITUTE OF PHYSICS   (Slovakia)

Author keywords

Aluminium nitride; Atomic force microscopy; Reactive sputtering; X Ray diffraction

Indexed keywords

ALUMINUM NITRIDE; ATOMIC FORCE MICROSCOPY; DEPOSITION; MAGNETRON SPUTTERING; SILICON; X RAY DIFFRACTION;

GROWTH RATE; GROWTH STABILIZATION;

PROTECTIVE COATINGS;

FILM;

EID: 1842665088     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.10.054     Document Type: Article

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