The deposition of aluminum nitride on silicon by plasma-enhanced metal-organic chemical vapour deposition

Diamond and Related Materials

Volumn 5, Issue 10, 1996, Pages 1210-1213

  Stauden, Th ^a   Eichhorn, G ^a   Cimalla, V ^a   Pezoldt, J ^a   Ecke, G ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

AES; Aluminium nitride; PE CVD; Structural characterisation

Indexed keywords

EID: 0004797068     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(96)00512-2     Document Type: Article

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